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Proceedings Paper

An Optical Method For In-Line Glass Flow Control
Author(s): A. Tissier; A. Poncet; G. Giroult; D. Maystre; P. Vincent
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Paper Abstract

Oxide reflow, employed in IC technology to planarize the dielectric layers, is a critical step in multilevel CMOS processes. We have studied the control of the oxide reflow profile using laser beam diffraction by a line grating printed in the oxide film. Using an experimental set-up to record the diffracted light we found that a relation exists between the line profile and the diffraction pattern. In order to obtain a better understanding we developed a theoretical description of the full phenomenon : we first modelized the glass reflow as a purely viscous flow using numerical simulations. The diffraction was then analysed using a theory based on Maxwell equations and the corresponding equations were discretized. A good fit between theory and experiment was found showing a significant and sensitive correlation between the line profile and the diffraction pattern evolutions. These results lead to a new non-destructive in-line glass flow control method.

Paper Details

Date Published: 10 March 1989
PDF: 8 pages
Proc. SPIE 1012, In-Process Optical Measurements, (10 March 1989); doi: 10.1117/12.949347
Show Author Affiliations
A. Tissier, Centre National d'Etude des Telecommunications (France)
A. Poncet, Centre National d'Etude des Telecommunications (France)
G. Giroult, Centre National d'Etude des Telecommunications (France)
D. Maystre, Universite AIX Marseille III (France)
P. Vincent, Universite AIX Marseille III (France)


Published in SPIE Proceedings Vol. 1012:
In-Process Optical Measurements
Kenneth H. Spring, Editor(s)

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