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Proceedings Paper

In-Process Control Of Specific Thin Film Properties In Large Scale Dc-Reactive Sputtering Machines
Author(s): Sabine Muller; Gunter Brauer; Wilfried Dicken; Eberhard SchultheiB; Peter Wirz
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Paper Abstract

For DC-reactive magnetron sputtering of different dielectric materials control algorithms have been derived to stabilize the discharge in the transition region between metallic and reactive mode. On-line measurement technology has been integrated to the large scale production machine concept to compensate long time effects and guarantee high reproducibility.

Paper Details

Date Published: 10 March 1989
PDF: 8 pages
Proc. SPIE 1012, In-Process Optical Measurements, (10 March 1989); doi: 10.1117/12.949326
Show Author Affiliations
Sabine Muller, Leyboid AG (Germany)
Gunter Brauer, Leyboid AG (Germany)
Wilfried Dicken, Leyboid AG (Germany)
Eberhard SchultheiB, Leyboid AG (Germany)
Peter Wirz, Leyboid AG (Germany)


Published in SPIE Proceedings Vol. 1012:
In-Process Optical Measurements
Kenneth H. Spring, Editor(s)

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