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Proceedings Paper

Interface Scattering Of Light From Oxidized Copper Surfaces
Author(s): A. Roos; M. Bergkvist; C. G. Ribbing
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Paper Abstract

Spectral structure in the diffuse reflectance of light from oxidized copper films on glass is reported. It has been experimentally verified that the growth of the oxide in the parent metal is essential for the development of interface roughness between the oxide and copper. This causes strong scattering of the reflected radiation. The scattering exhibits sepctral intensity variations which are oppositely phased to the regular interference pattern. It has been found that the diffuse reflectance scales very closely with the averaged electric field intensity at the oxide/metal interface. A model is presented, which is used to calculate diffuse reflectance spectra. It is shown that fitting of the calculated diffuse reflectance spectra to the experimental results gives quantitative information about the roughness of both interfaces. For oxidized copper films, excellent agreement has been found between the calculations and the values obtained by surface profilometry and TIS measurements on the bare copper film obtained after etching in hydrochloric acid.

Paper Details

Date Published: 21 March 1989
PDF: 7 pages
Proc. SPIE 1009, Surface Measurement and Characterization, (21 March 1989); doi: 10.1117/12.949170
Show Author Affiliations
A. Roos, Uppsala University (Sweden)
M. Bergkvist, Uppsala University (Sweden)
C. G. Ribbing, Uppsala University (Sweden)

Published in SPIE Proceedings Vol. 1009:
Surface Measurement and Characterization
Jean M. Bennett, Editor(s)

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