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Proceedings Paper

Multilayer Reflection Filters For Soft X-Rays
Author(s): Mihiro Yanagihara; Masaki Yamamoto; Akira Arai; Jianlin Cao; Takeshi Namioka
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Paper Abstract

Multilayer reflection filters were designed for use in photo-CVD experiments with soft X-rays of ≈100 eV. Mo/Si (27 layers) and Rh/Si (21 layers) filters were fabricated on superpolished CVD-SiC substrates by means of ion-beam sputtering. Their spectral reflectances were measured at 10°-55° angles of incidence over a photon energy range of 65-115 eV. A peak reflectance of 43% and a FWIIM of ≈8 eV were found at ≈49° angle of incidence for soft X-rays of ≈100 eV. The filters were then used as a dispersive element in photo-CVD experiments at the Photon Factory. It was found that the filters could withstand strong undispersed synchrotron radiation for many hours, retaining a reflectance of ≈28%, and that they were able to deliver a narrow-band photon flux of ≈1015 photons/s at ≈100 eV into the photo-reaction chamber.

Paper Details

Date Published: 16 December 1988
PDF: 6 pages
Proc. SPIE 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers, (16 December 1988); doi: 10.1117/12.948791
Show Author Affiliations
Mihiro Yanagihara, Tohoku University (Japan)
Masaki Yamamoto, Tohoku University (Japan)
Akira Arai, Tohoku University (Japan)
Jianlin Cao, Tohoku University (Japan)
Takeshi Namioka, Tohoku University (Japan)


Published in SPIE Proceedings Vol. 0984:
X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers
Finn Erland Christensen, Editor(s)

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