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Proceedings Paper

Layered synthetic multilayers for high resolution X-ray reflection in the 6 to 8 keV region.
Author(s): E J. Puik; M J van der Wiel; J. Verhoeven
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Paper Abstract

In this paper results are presented of the deposition and characterization of Ni - C and NiSi - C multilayer coatings consisting of a large number of layers (typically 475; d = 22.3 Å) containing ultra thin metal layers (4 Å). During deposition, information about changes in the roughness of the top interface is obtained using an in situ X-ray reflectometer. Afterwards the coatings have been characterized using CuKα diffraction; the resolutions and relative reflectivities have been determined. The influence of the presence of a hydrogen atmosphere during deposition and the effect of mixing Si with Ni have been studied. Finally we report on a Ni - C multilayer coating consisting of 815 layers, having a resolution λ/Δλ of 275.

Paper Details

Date Published: 16 December 1988
PDF: 8 pages
Proc. SPIE 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers, (16 December 1988); doi: 10.1117/12.948777
Show Author Affiliations
E J. Puik, FOM Institute for Plasmaphysics 'Rijnhuizen' (The Netherlands)
M J van der Wiel, FOM Institute for Plasmaphysics 'Rijnhuizen' (The Netherlands)
J. Verhoeven, FOM Institute for Atomic and Molecular Physics (The Netherlands)


Published in SPIE Proceedings Vol. 0984:
X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers
Finn Erland Christensen, Editor(s)

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