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Proceedings Paper

Analysis Of The Smoothing Process Observed During The Soft X-Ray Multilayer Deposition
Author(s): Ph. Houdy; P. Boher; C. Schiller; P. Luzeau; R. Barchewitz; N. Alehyane; M. Ouahabi
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Paper Abstract

We have observed that carbon tungsten multilayers smooth substrate surface defects at atomic scale. We have made experiments to understand what is the process responsible of this effect. We have realized silicon tungsten multilayer and carbon single layer to smooth different rough substrate (Li F, frosted Float-Glass). Grazing X-ray reflection (1.54 Å) and soft X-ray reflectivity (44.7 Å) measurements have been used to characterize roughness before and after deposit and in-situ kinetic ellipsometry to understand interfaces formation. Carbon appears to be the determinant factor of the smoothing process.

Paper Details

Date Published: 16 December 1988
PDF: 9 pages
Proc. SPIE 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers, (16 December 1988); doi: 10.1117/12.948775
Show Author Affiliations
Ph. Houdy, Laboratoires d'Electronique et de Physique Apoliauqee (France)
P. Boher, Laboratoires d'Electronique et de Physique Apoliauqee (France)
C. Schiller, Laboratoires d'Electronique et de Physique Apoliauqee (France)
P. Luzeau, Laboratoires d'Electronique et de Physique Apoliauqee (France)
R. Barchewitz, Universite Paris (France)
N. Alehyane, Universite Paris (France)
M. Ouahabi, Universite Paris (France)


Published in SPIE Proceedings Vol. 0984:
X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers
Finn Erland Christensen, Editor(s)

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