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Proceedings Paper

Application Of W/Si Multilayers For Monochromatization Of Soft X-Ray Synchrotron Radiation
Author(s): F. Schaefers; M. Grioni; J. Wood; H. Van Brug; E. J. Puik; M. Dapor; F. Marchetti
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Paper Abstract

We have used W/Si multilayers and multilayer/KAP crystal combinations in a double crystal monochromator beamline at BESSY. The throughput in the energy region from 200 to 1600 eV was drastically increased as compared with previous experiments and thus the performance compares favourably with other monochromators using conventional optics in this energy region. XAS spectra of the 2p edges of 3d transition metals are shown. No x-ray induced damage of the multilayers could be detected using Auger depth profile analysis after one week of exposure to the synchrotron beam. AES profiles distinguished up to the first 30 layers. Our XAS results open up the possibility of constructing multielement high resolution soft x-ray monochromators as well as high intensity broadband monochromators.

Paper Details

Date Published: 18 January 1989
PDF: 8 pages
Proc. SPIE 0983, Thin Film Neutron Optical Devices: Mirrors, Supermirrors, Multilayer Monochromators, Polarizers, and Beam Guides, (18 January 1989); doi: 10.1117/12.948760
Show Author Affiliations
F. Schaefers, BESSY (Germany)
M. Grioni, University of Nijmegen (Netherlands)
Universite de Paris-Sud (France)
J. Wood, Ovonic Synthetic Materials (United States)
H. Van Brug, FOM Institute for plasma physics (The Netherlands)
E. J. Puik, FOM Institute for plasma physics (The Netherlands)
M. Dapor, IRST (Italy)
F. Marchetti, IRST (Italy)


Published in SPIE Proceedings Vol. 0983:
Thin Film Neutron Optical Devices: Mirrors, Supermirrors, Multilayer Monochromators, Polarizers, and Beam Guides
Charles F. Majkrzak, Editor(s)

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