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Proceedings Paper

Characterization Of Imperfections In Thin-Film Multilayer Devices
Author(s): A. M. Saxena
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Paper Abstract

The fabrication of high reflectivity multilayer minochromators usually involves depositing a greater number of bilayers than the calculated number for perfect multilayers. This deviation from ideal behavior occurs due to the presence of imperfections in layers. These imperfections are strongly dependent on the deposition process employed and the parameters during deposition. An understanding of the types of imperfections present may lead to attempts to minimize them. The imperfections should be taken into consideration for determining the sequence of d-spacing for making a supermirror.

Paper Details

Date Published: 18 January 1989
PDF: 7 pages
Proc. SPIE 0983, Thin Film Neutron Optical Devices: Mirrors, Supermirrors, Multilayer Monochromators, Polarizers, and Beam Guides, (18 January 1989); doi: 10.1117/12.948744
Show Author Affiliations
A. M. Saxena, Brookhaven National Laboratory (United States)


Published in SPIE Proceedings Vol. 0983:
Thin Film Neutron Optical Devices: Mirrors, Supermirrors, Multilayer Monochromators, Polarizers, and Beam Guides
Charles F. Majkrzak, Editor(s)

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