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Proceedings Paper

Surface Figuring Using Neutral Ion Beams
Author(s): S. R. Wilson; D W Reicher; J R McNeil
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Paper Abstract

During recent years, economic and technological pressures have driven research for higher performance optical fabrication techniques. Among the candidate figuring technologies is ion beam sputtering in which material is removed from the optical surface by the kinetic interaction of ions and atoms or molecules of the surface. The first use of sputtering as a means for optical figuring occurred in the mid 1960's [1,2], and the technique has been investigated by several groups since that time. The prior work was done primarily with ion sources producing high energy (20KeV and above), low current (fraction of a milliampere), narrow (usually less than one millimeter) ion beams. The low current directly translates to low removal rates, while the high energy contributes to radiation damage, ion implantation, and other effects. In the present work the low current, high energy source is replaced with a Kaufman broad-beam ion source[3]. These sources produce higher ion currents at lower energies, thus giving faster removal with minimal surface damage. The ion beam produced by a Kaufman ion source consists of a number of ions traveling in a (typi-cally) slightly diverging beam, along with an equal flux of lower energy electrons. The electrons are injected into the ion beam to reduce electrostatic repulsion in the beam, but also to prevent the charging of dielectric targets.

Paper Details

Date Published: 29 January 1989
PDF: 8 pages
Proc. SPIE 0966, Advances in Fabrication and Metrology for Optics and Large Optics, (29 January 1989); doi: 10.1117/12.948051
Show Author Affiliations
S. R. Wilson, University of New Mexico (United States)
D W Reicher, University of New Mexico (United States)
J R McNeil, University of New Mexico (United States)


Published in SPIE Proceedings Vol. 0966:
Advances in Fabrication and Metrology for Optics and Large Optics
Jones B. Arnold; Robert E. Parks, Editor(s)

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