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Proceedings Paper

Inspection Of Patterned Wafer Surface Using Electrooptic Spatial Light Modulator
Author(s): Hitoshi Tanaka; Youko Miyazaki; Noboru Mikami; Nobuyuki Kosaka; Toshimasa Tomoda
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Paper Abstract

An electrooptic spatial light modulator, used as an intensity spatial filter, makes real-time inspection of periodic patterns possible by making the adjustment of object attitude unnecessary. The ways for preparing the filter and detecting defects in periodic pattern in real time are described. Results of detection of defects are presented.

Paper Details

Date Published: 8 February 1988
PDF: 4 pages
Proc. SPIE 0963, Optical Computing '88, (8 February 1988); doi: 10.1117/12.947886
Show Author Affiliations
Hitoshi Tanaka, Mitsubishi Electric Corporation (Japan)
Youko Miyazaki, Mitsubishi Electric Corporation (Japan)
Noboru Mikami, Mitsubishi Electric Corporation (Japan)
Nobuyuki Kosaka, Mitsubishi Electric Corporation (Japan)
Toshimasa Tomoda, Mitsubishi Electric Corporation (Japan)

Published in SPIE Proceedings Vol. 0963:
Optical Computing '88
Pierre H. Chavel; Joseph W. Goodman; Gerard Roblin, Editor(s)

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