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Proceedings Paper

Two Anti-Reflective Coatings For Use Over Highly Reflective Topography
Author(s): A. T. Jeffries; M. Toukhy; T. R. Sarubbi
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Paper Abstract

Two anti-reflective coatings have been developed which eliminate linewidth variation of HPR-204 and HX-256 over stepped highly reflective topography. These anti-reflective coatings are composed of non-photoactive modified polyimides and laser dyes. Thin coatings exhibit the following desirable properties; strong absorption of 436nm light, the ability to dry etch, resistance to flow at 200°C, and good planarization properties.

Paper Details

Date Published: 18 April 1985
PDF: 7 pages
Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); doi: 10.1117/12.947851
Show Author Affiliations
A. T. Jeffries, Philip A. Hunt Chemical Corporation (United States)
M. Toukhy, Philip A. Hunt Chemical Corporation (United States)
T. R. Sarubbi, Philip A. Hunt Chemical Corporation (United States)


Published in SPIE Proceedings Vol. 0539:
Advances in Resist Technology and Processing II
Larry F. Thompson, Editor(s)

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