Share Email Print
cover

Proceedings Paper

A Review Of Contrast In Positive Photoresists
Author(s): Ronald W. Wake; Marie C. Flanigan
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The literature dealing with contrast in positive photoresists is reviewed. Pertinent definitions are relayed followed by a survey of the various methods proposed for the measurement of contrast. The processing techniques used to improve contrast are also enumerated along with the advantages and disadvantages of each.

Paper Details

Date Published: 18 April 1985
PDF: 8 pages
Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); doi: 10.1117/12.947845
Show Author Affiliations
Ronald W. Wake, Allied Chemical (United States)
Marie C. Flanigan, Allied Chemical (United States)


Published in SPIE Proceedings Vol. 0539:
Advances in Resist Technology and Processing II
Larry F. Thompson, Editor(s)

© SPIE. Terms of Use
Back to Top