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Proceedings Paper

Linewidth Control In Optical Projection Printing: Influence Of Resist Parameters
Author(s): Wolfgang Arden; Leonhard Mader
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Paper Abstract

Photoresist linewidth profiles for optical projection printing with high performance stepper lenses were simulated using the SAMPLE program. Profile slopes and linewidth variations of resist structures on profiled surfaces (silicon and aluminum substrates) have been investigated in dependance on photoresist parameters such as optical absorption coefficient and thickness of the photoresist as well as exposure/development time. The study also discusses the influence of exposure wavelength (g-line vs. h-line vs. i-line) on line edge slope and standing wave effects.

Paper Details

Date Published: 18 April 1985
PDF: 8 pages
Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); doi: 10.1117/12.947836
Show Author Affiliations
Wolfgang Arden, Siemens Research Laboratories (Germany)
Leonhard Mader, Siemens Research Laboratories (Germany)


Published in SPIE Proceedings Vol. 0539:
Advances in Resist Technology and Processing II
Larry F. Thompson, Editor(s)

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