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Proceedings Paper

Soft X-Ray Spectral Characterization Of Resist Using Synchrotron Radiation
Author(s): Kozo Mochiji; Takeshi Kimura; Hidehito Obayashi; Hideki Maezawa
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Paper Abstract

Soft X-ray absorption spectra and spectral sensitivity of X-ray resist are studied using synchrotron radiation. A measurement technique for spectral sensitivity named X-ray Excited Ion Mass Analysis is newly developed. Spectral sensitivity is evaluated from the fragment yield of the decomposed resist during exposure to monochromatized synchrotron radiation. Using this technique, the spectral sensitivity of poly-2-methylpentene-1-sulfone is measured. The sensitivity is found to be enhanced at shorter wavelengths despite a low absorption coefficient.

Paper Details

Date Published: 18 April 1985
PDF: 6 pages
Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); doi: 10.1117/12.947815
Show Author Affiliations
Kozo Mochiji, Hitachi Ltd. (Japan)
Takeshi Kimura, Hitachi Ltd. (Japan)
Hidehito Obayashi, Hitachi Ltd. (Japan)
Hideki Maezawa, National Laboratory for High Energy Physics (Japan)


Published in SPIE Proceedings Vol. 0539:
Advances in Resist Technology and Processing II
Larry F. Thompson, Editor(s)

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