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Proceedings Paper

The Characterization And Simulation Of Spin-Coated Resist Contours
Author(s): L. K. White
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Paper Abstract

A method of characterizing and simulating spun-on resist coating contours is described. A low-pass frequency filter is applied to the uncoated contour (topography). Two parameters, P. and a, describe the low-pass frequency filters that estimate the coating contours of different spun-on solutions. The frequency filter parameters are derived solely from step-height measurements of coated isolated-line features. Radial flow-induced coating anomalies are also discussed. These anomalies produce different coating contours for features at different orientations and positions with respect to the centrifugal center of the substrate. A simulated coating contour on a three-dimensional device structure is presented to show the typical thickness changes produced by spun-on positive resist films. A correction for film shrinkage is sometimes required for this simulation procedure.

Paper Details

Date Published: 18 April 1985
PDF: 7 pages
Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); doi: 10.1117/12.947811
Show Author Affiliations
L. K. White, David Sarnoff Research Center (United States)


Published in SPIE Proceedings Vol. 0539:
Advances in Resist Technology and Processing II
Larry F. Thompson, Editor(s)

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