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Proceedings Paper

Polarized Laser Scan Technique For Patterned Wafer Surface Contaminants Inspection
Author(s): Mitsuyoshi Koizumi; Nobuyuki Akiyama
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Paper Abstract

A new system for detecting contaminants on patterned Si wafers is described. The system employs a linearly polarized He-Ne laser light to scan obliquely across the wafer surfaces, and optical detection technique to distinguish the contaminants from the patterns by measuring the polarization of the light reflected from both the contaminants and the patterns.

Paper Details

Date Published: 23 July 1985
PDF: 5 pages
Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); doi: 10.1117/12.947770
Show Author Affiliations
Mitsuyoshi Koizumi, Hitachi, Ltd. (Japan)
Nobuyuki Akiyama, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 0538:
Optical Microlithography IV
Harry L. Stover, Editor(s)

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