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Proceedings Paper

PROLITH: A Comprehensive Optical Lithography Model
Author(s): Chris A. Mack
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Paper Abstract

The Positive Resist Optical Lithography model (PROLITH) is introduced. The model predicts resist profiles for submicron projection, proximity and contact printing. Included are models for optical projection systems, the standing wave effect for projection printing, a diffraction model for contact printing, a kinetic model for the exposure reaction, and a kinetic model of the development process. Also included in PROLITH are the effects of prebake conditions and polychromatic exposure.

Paper Details

Date Published: 23 July 1985
PDF: 14 pages
Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); doi: 10.1117/12.947767
Show Author Affiliations
Chris A. Mack, Department of Defense (United States)

Published in SPIE Proceedings Vol. 0538:
Optical Microlithography IV
Harry L. Stover, Editor(s)

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