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Proceedings Paper

Modeling The Optical Microscope Images Of Thick Layers For The Purpose Of Linewidth Measurement
Author(s): Chris P. Kirk; Diana Nyyssonen
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Paper Abstract

A monochromatic, waveguide model is presented which can predict the optical microscope images of thick-layer objects including multilayer structures with sloping, curved, and undercut edges, granular structures such as polysilicon, and asymmetric objects. The model is used to illustrate the effects of line structure on the optical image. Qualitative agreement with experimentally obtained optical image profiles is demonstrated. Application of the model to study the effects of variations in layer thickness and edge geometry on linewidth measurements made at different stages of manufacturing an MOS device is discussed.

Paper Details

Date Published: 23 July 1985
PDF: 11 pages
Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); doi: 10.1117/12.947764
Show Author Affiliations
Chris P. Kirk, Vickers Instruments and Leeds University (England)
Diana Nyyssonen, National Bureau of Standards (United States)


Published in SPIE Proceedings Vol. 0538:
Optical Microlithography IV
Harry L. Stover, Editor(s)

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