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Proceedings Paper

Application Of A Contrast Enhancement Material To Broadband Projection Printing
Author(s): Edward K. Pavelchek; Vivian B. Valenty; Robert E. Williams,Jr.
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Paper Abstract

A Contrast Enhancement Material (CEM), G.E. Altilith CEM-388, has been gaining acceptance on semiconductor fabrication lines using h line step-and-repeat systems. Although a bilevel system, the use of CEM-388 is relatively simple, and has shown significant increases in practical resolution when used at 405 nm. A considerable advantage may also be gained by using this system with Micralign projection printers, especially in improving resolution over steps. This paper will present the practical aspects of using CEM-388 in such systems and illustrate the effects on resolution, step coverage, C.D. control, and wafer throughput. The presence and control of inhibition effects will also be discussed.

Paper Details

Date Published: 23 July 1985
PDF: 8 pages
Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); doi: 10.1117/12.947750
Show Author Affiliations
Edward K. Pavelchek, Perkin-Elmer Corporation (United States)
Vivian B. Valenty, General Electric Company (United States)
Robert E. Williams,Jr., General Electric Company (United States)

Published in SPIE Proceedings Vol. 0538:
Optical Microlithography IV
Harry L. Stover, Editor(s)

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