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Proceedings Paper

High Performance Retrofit Condenser For Perkin-Elmer Aligners
Author(s): Ray Winn; Ron Hershel
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Paper Abstract

A retrofit illuminator for the High Performance Condenser for the 100, 200, and 300 series Perkin-Eimer Micralign projection aligners is discussed. Comparisons of the major performance features between the two systems is made shoeing dramatic improvements in wafer through-put, a reduction of nearly 2,000 watts of electrical power consumption, reduction of the arc slit width, and significantly reduced maintenance time. Some SEM's of typical lithography are also presented.

Paper Details

Date Published: 23 July 1985
PDF: 8 pages
Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); doi: 10.1117/12.947749
Show Author Affiliations
Ray Winn, Advanced Semiconductor Products (United States)
Ron Hershel, Hershel Consulting, Inc. (United States)

Published in SPIE Proceedings Vol. 0538:
Optical Microlithography IV
Harry L. Stover, Editor(s)

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