Proceedings PaperOne Micron 1X Stepper Photolithography: An Introductory View
|Format||Member Price||Non-Member Price|
A feasibility study of 1X optical stepper for one micron lithography in a manufacturing environment is conducted. The present discussion concentrates on the availability and per-formance of production-worthy 1X optical stepper, and the manufacturability of one micron reticle including the 0.5μm defect inspection. The Ultratech Stepper Model 1000 with one micron lens and the KLA-208 automatic reticle inspection system are evaluated and their performances are discussed.