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Proceedings Paper

One Micron 1X Stepper Photolithography: An Introductory View
Author(s): Mark S. Chang
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Paper Abstract

A feasibility study of 1X optical stepper for one micron lithography in a manufacturing environment is conducted. The present discussion concentrates on the availability and per-formance of production-worthy 1X optical stepper, and the manufacturability of one micron reticle including the 0.5μm defect inspection. The Ultratech Stepper Model 1000 with one micron lens and the KLA-208 automatic reticle inspection system are evaluated and their performances are discussed.

Paper Details

Date Published: 23 July 1985
PDF: 6 pages
Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); doi: 10.1117/12.947744
Show Author Affiliations
Mark S. Chang, SEEQ Technology, Inc. (United States)

Published in SPIE Proceedings Vol. 0538:
Optical Microlithography IV
Harry L. Stover, Editor(s)

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