Share Email Print

Proceedings Paper

Double Telecentric Wafer Stepper Using Laser Scanning Method
Author(s): Akiyoshi Suzuki
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A stepper of new concept has been developed. It uses double telecentric lens and TTL laser scanning method. It is TTL on axis stepper in the ture sense, because alignment is checked directly before exposure. The projection optics can resolve 1.0 μm in production and has small distortion. The alignment accuracy within 0.25 μm ( 3 o) is achieved.

Paper Details

Date Published: 23 July 1985
PDF: 7 pages
Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); doi: 10.1117/12.947740
Show Author Affiliations
Akiyoshi Suzuki, Canon Inc. (Japan)

Published in SPIE Proceedings Vol. 0538:
Optical Microlithography IV
Harry L. Stover, Editor(s)

© SPIE. Terms of Use
Back to Top