Share Email Print
cover

Proceedings Paper

Recent Advances Of Optical Step-And-Repeat System
Author(s): N. Shiotake; S. Yoshida
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The current model of an optical step and repeat system for use in production line has a projection lens with a resolution of l.0m and provides a machine-to-machine overlay accuracy of approximately ±0.2 pm (95% range). The accuracy is to be further improved with a newly developed field-by-field alignment system. The i-line projection lens, developed for higher resolution, adequately resolves 0.8um lines and spaces.

Paper Details

Date Published: 20 June 1985
PDF: 7 pages
Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947498
Show Author Affiliations
N. Shiotake, Nippon Kogaku K.K. (Japan)
S. Yoshida, Nippon Kogaku K.K. (Japan)


Published in SPIE Proceedings Vol. 0537:
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV
Phillip D. Blais, Editor(s)

© SPIE. Terms of Use
Back to Top