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Proceedings Paper

Analytical Applications Of Focused Ion Beams
Author(s): N. W. Parker; W. P. Robinson; R. Levi -Setti; Y. L. Wang; G. Crow
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Paper Abstract

MicroBeam has under development a focused ion beam instrument intended for a wide range of applications, including microscopy (using secondary electrons), high spatial resolution microanalysis (using secondary ion mass spectrometry), and microfabrication (using ion implantation and sputtering). High collection efficiency SIMS optics enables gray scale elemental maps to be made with resolutions of 200 angstroms. Results from early application studies are presented, including high spatial resolution SIMS in microelectronics, microbiology, and cosmochemistry.

Paper Details

Date Published: 20 June 1985
PDF: 9 pages
Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947492
Show Author Affiliations
N. W. Parker, MicroBeam, Inc. and University of Chicago (United States)
W. P. Robinson, MicroBeam, Inc. (United States)
R. Levi -Setti, MicroBeam, Inc. and University of Chicago (United States)
Y. L. Wang, University of Chicago (United States)
G. Crow, University of Chicago (United States)


Published in SPIE Proceedings Vol. 0537:
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV
Phillip D. Blais, Editor(s)

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