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Proceedings Paper

Bright Discharge Plasma Sources For X-Ray Lithography
Author(s): Jay S. Pearlman; John C. Riordan
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Paper Abstract

There are substantial advantages to bright plasma sources for submicron X-ray lithography. For example, throughputs of 40 wafer levels per hour can be maintained using existing, high resolution, single level resists. The high X-ray brightness of the discharge plasma source is achieved by operating at much higher energy density than conventional sources. The X-rays are emitted from a high temperature plasma, which is magnetically confined and dissipates its energy isotropically. Over the last two years, a significant effort at Maxwell Laboratories has been carried out to characterize the Z-pinch plasma source for applications such as lithography and microscopy. The technology has been brought to the point where high reliability, commercially available sources have been developed for X-ray microscopy. The state-of-the-art is discussed and projections are provided on the capabilities of high power bright discharge sources for lithographic applications.

Paper Details

Date Published: 20 June 1985
PDF: 8 pages
Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947490
Show Author Affiliations
Jay S. Pearlman, Maxwell Laboratories, Inc. (United States)
John C. Riordan, Maxwell Laboratories, Inc. (United States)


Published in SPIE Proceedings Vol. 0537:
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV
Phillip D. Blais, Editor(s)

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