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Proceedings Paper

X-Ray Lithography: Can It Be Justified
Author(s): Alan D. Wilson
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Paper Abstract

X-Ray lithography: Can it be justified? This is a question which is being asked in many circles today. The answer is, unfortunately, not black or white nor is it easy to determine. However, there are today more serious players in the x-ray field than there were a few years ago and maybe this is an important indicator. In this paper we will try to establish if x-ray lithography can or can not be soundly justified.

Paper Details

Date Published: 20 June 1985
PDF: 17 pages
Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947489
Show Author Affiliations
Alan D. Wilson, IBM Thomas J. Watson Research Center (United States)


Published in SPIE Proceedings Vol. 0537:
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV
Phillip D. Blais, Editor(s)

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