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Proceedings Paper

X-Ray Lithography At The Stanford Synchrotron Radiation Laboratory (SSRL)
Author(s): P. Pianetta; R. Redaelli; R. Jaeger; T. W. Barbee
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Paper Abstract

A dedicated X-ray lithography system has been developed on Beam Line III-4 at the Stanford Synchrotron Radiation Laboratory (SSRL). The research program at SSRL includes studies of the spectral sensitivity of X-ray resists, mask characterization, and the applications of novel X-ray optics. The facilities available for this work and recent results in these areas will be described.

Paper Details

Date Published: 20 June 1985
PDF: 6 pages
Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947487
Show Author Affiliations
P. Pianetta, Stanford University (United States)
R. Redaelli, Stanford University (United States)
R. Jaeger, Hewlett-Packard Laboratories (United States)
T. W. Barbee, Stanford University (United States)


Published in SPIE Proceedings Vol. 0537:
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV
Phillip D. Blais, Editor(s)

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