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Proceedings Paper

Recent Printing And Registration Results With X-Ray Lithography
Author(s): B. Fay; L. Tai; D. Alexander
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Paper Abstract

X-ray lithography has matured from a research and development phase to an implementation phase. Accordingly, the concerns have shifted from imaging issues to those of registration, critical dimension control, step height coverage, and system repeatability. In this paper, results will be discussed relating to x-ray printing and registration for full field alignment systems with 100mm field diameter using optical verniers, SEM (scanning electron microscope) and electrical wafer probe techniques. These results will encompass micrometer and submicrometer imaging using single 'level and tri-level processing techniques.

Paper Details

Date Published: 20 June 1985
PDF: 12 pages
Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947486
Show Author Affiliations
B. Fay, Micronix Corporation (United States)
L. Tai, Micronix Corporation (United States)
D. Alexander, Micronix Corporation (United States)


Published in SPIE Proceedings Vol. 0537:
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV
Phillip D. Blais, Editor(s)

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