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Proceedings Paper

Digital Processing Of Beam Signals In A Variably Shaped Electron Beam Lithography System
Author(s): G. Matsuoka; H. Yokouchi; M. Okumura; T. Matsuzaka; N. Saitou; N. Nakamura
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Paper Abstract

This paper discusses signal processing procedures which have been developed for three important beam adjustments required by variably shaped electron beam lithography systems: dynamic focussing adjustment, deflection distortion correction and beam size adjustment. Precise and speedy measurement of edge slope, beam position and beam size are all necessary in this context. To execute these measurements, backscattered electron signals are stored in a buffer memory following digital scanning of a shaped beam across a fiducial mark. These signals are then digitally processed in a control computer. These procedures have been applied to an EB lithography system (HL-600). Pattern accuracy of 0.2 μm over a 6.5x6.5 mm field and overlay accuracy of 0.1 μm were obtained.

Paper Details

Date Published: 20 June 1985
PDF: 10 pages
Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947483
Show Author Affiliations
G. Matsuoka, Hitachi, Ltd. (Japan)
H. Yokouchi, Hitachi, Ltd. (Japan)
M. Okumura, Hitachi, Ltd. (Japan)
T. Matsuzaka, Hitachi, Ltd. (Japan)
N. Saitou, Hitachi, Ltd. (Japan)
N. Nakamura, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 0537:
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV
Phillip D. Blais, Editor(s)

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