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Proceedings Paper

Measuring The Performance Of The AEBLE [sub]tm[/sub] 150 Direct-Write A-Beam Lithography Equipment
Author(s): Allen M. Carroll; Jorge L. Freyer
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Paper Abstract

Lithographic pattern quality is of paramount importance for the fabrication of microcircuits with submicrometer critical dimensions. The AEBLE 150 direct-write e-beam lithography equipment recently announced by Perkin-Elmer is destined for application in the submicrometer domain, and it will employ on-line quality measurement tools to ensure consistent machine performance and productivity. In this paper, we discuss the strategies to be employed in developing pattern quality measurement tools for AEBLE, and we illustrate early results obtained using the prototype AEBLE and mensuration techniques developed for Perkin-Elmer's mask-making product, MEBES® III. These preliminary results will be used to guide the evolution of AEBLE's quality-assurance tools. We present a scenario for that evolution, including a discussion of measurable parameters and user interfaces.

Paper Details

Date Published: 20 June 1985
PDF: 9 pages
Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947482
Show Author Affiliations
Allen M. Carroll, Perkin-Elmer Corporation (United States)
Jorge L. Freyer, Perkin-Elmer Corporation (United States)


Published in SPIE Proceedings Vol. 0537:
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV
Phillip D. Blais, Editor(s)

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