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Proceedings Paper

Performance Testing Of The Waferwriter Tm Electron Beam Direct Write System
Author(s): W. R. Livesay; J.Dennis Russell; Dave Harry; James S. Hulett; A. L. Rubiales; J. E. Wolfe
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Paper Abstract

Performance tests on the Waferwriter TM system, a high brightness electron beam direct write system, are described. The Waferwriter system is an ultra-high current density, variable size round beam direct write system, capable of exposing existing popular photo-resists at higher rates than conventional shaped beam systems in the micron and submicron feature size range. Performance tests are described covering overlay accuracy, alignment, resolution, and throughput. The system is the first to meet the DoD's VHSIC requirements for E-beam direct write systems.

Paper Details

Date Published: 20 June 1985
PDF: 5 pages
Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947480
Show Author Affiliations
W. R. Livesay, Electron Vision Corporation (United States)
J.Dennis Russell, Electron Vision Corporation (United States)
Dave Harry, Electron Vision Corporation (United States)
James S. Hulett, Electron Vision Corporation (United States)
A. L. Rubiales, Electron Vision Corporation (United States)
J. E. Wolfe, Electron Vision Corporation (United States)


Published in SPIE Proceedings Vol. 0537:
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV
Phillip D. Blais, Editor(s)

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