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Proceedings Paper

Surface Potential Characterization Of The Photoelectrochemical Etching System By Photoreflectance And Electroreflectance Techniques
Author(s): A. E. Willner; O. J. Glembocki; D. V. Podlesnik; E. D. Palik; R. M. Osgood
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Paper Abstract

We use the modulation techniques of electrolyte electroreflectance and photoreflectance to locally probe the semiconductor surface potential of various semiconductor/electrolyte interfaces. Changes in the surface potential are important in determining the rate of charge transfer in both electrode and electrodeless photochemical etching.

Paper Details

Date Published: 9 August 1988
PDF: 9 pages
Proc. SPIE 0946, Spectroscopic Characterization Techniques for Semiconductor Technology III, (9 August 1988); doi: 10.1117/12.947412
Show Author Affiliations
A. E. Willner, Columbia University (United States)
O. J. Glembocki, Naval Research Laboratory (United States)
D. V. Podlesnik, Columbia University (United States)
E. D. Palik, Naval Research Laboratory (United States)
R. M. Osgood, Columbia University (United States)


Published in SPIE Proceedings Vol. 0946:
Spectroscopic Characterization Techniques for Semiconductor Technology III
Orest J. Glembocki; Fred H. Pollak; Fernando A. Ponce, Editor(s)

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