Share Email Print
cover

Proceedings Paper

The Effect Of Surface Stoichiometry On The Initial Stages Of Heteroepitaxy Of II-VI Compounds Grown On (001)GaAs By Molecular Beam Epitaxy
Author(s): Takafumi Yao; Masami Fujimoto; Hiroshi Nakao
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The surface stoichiometry of GaAs substrates influences considerably the initial stages of heteroepitaxy of II-VI compounds on (001)GaAs by molecular beam epitaxy. The growth mechanism of ZnSe has been investigated using a RHEED observation system, with which the intensity and half width of diffraction spots are measured. The growth mechanism of ZnSe on thermally cleaned substrates is the Stranski-Krastanov mode, while that on As-stabilized GaAs substrates is varied from the Stranski-Krastanov mode to the two-dimensional layer by layer growth mode with growth conditions of ZnSe. For Se rich conditions, which is characterized by a (2x1) reconstructed surface, the two-dimensional growth mode dominates, while for Zn-rich growth conditions, which is characterized by a c(2x2) reconstructed surface, the Stranski-Krastanov mode dominates.

Paper Details

Date Published: 15 August 1988
PDF: 4 pages
Proc. SPIE 0944, Growth of Compound Semiconductor Structures II, (15 August 1988); doi: 10.1117/12.947350
Show Author Affiliations
Takafumi Yao, Electrotechnical Laboratory (Japan)
Masami Fujimoto, Electrotechnical Laboratory (Japan)
Hiroshi Nakao, Electrotechnical Laboratory (Japan)


Published in SPIE Proceedings Vol. 0944:
Growth of Compound Semiconductor Structures II
Anupam Madhukar, Editor(s)

© SPIE. Terms of Use
Back to Top