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Proceedings Paper

UV/Ozone Removal Of Contaminants In Spacecraft Environments
Author(s): C. B. Kalem; J. R. Blanco; R. J. Champetier
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Paper Abstract

The UV/Ozone cleaning process has been studied as both a method for preventing contamin-ant films from forming on optical surfaces of a space sensor during storage, and for removing them from these surfaces after formation. Using mercury resonance lines at 253.7 and 184.9 nm and 02 pressures in the range of 8 x 10-5 to 4 x 10-4 torr, removal efficiencies from 1.8 x 10-26 to 4.4 x 10-26 cm3/photon were measured. The UV/Ozone process has been shown to be an effective method for preventing contaminant buildup during the storage of a sensor. If the removal efficiencies can be improved, as expected, by using higher energy photons, the UV/Ozone process should also prove to be a viable method for cleaning contaminant films from optical surfaces in space.

Paper Details

Date Published: 16 August 1988
PDF: 6 pages
Proc. SPIE 0932, Ultraviolet Technology II, (16 August 1988); doi: 10.1117/12.946899
Show Author Affiliations
C. B. Kalem, Hughes Aircraft Company (United States)
J. R. Blanco, California State University (United States)
R. J. Champetier, TRW Inc. (United States)

Published in SPIE Proceedings Vol. 0932:
Ultraviolet Technology II
Robert E. Huffman, Editor(s)

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