Share Email Print
cover

Proceedings Paper

Buried Oxide Formation By Ion Implantation
Author(s): K. Steeples; M. A. Guerra
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

High power oxygen ion beams have been used to produce a buried insulating layer in silicon wafers. Standard materials analysis techniques show that a thermally stable insulating layer is formed beneath the single crystal surface layer of silicon, serving to isolate the surface from the substrate.

Paper Details

Date Published: 9 April 1985
PDF: 4 pages
Proc. SPIE 0530, Advanced Applications of Ion Implantation, (9 April 1985); doi: 10.1117/12.946493
Show Author Affiliations
K. Steeples, Eaton Corporation (United States)
M. A. Guerra, Eaton Corporation (United States)


Published in SPIE Proceedings Vol. 0530:
Advanced Applications of Ion Implantation
Michael I. Current; Devindra K. Sadana, Editor(s)

© SPIE. Terms of Use
Back to Top