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Proceedings Paper

Materials Characterization Tools For Advanced Ion Beam Processes
Author(s): Michael D. Strathman
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Paper Abstract

This paper will discuss the application of Rutherford backscattering technology and secondary ion mass spectrometry to advanced ion beam processes. Two particular processes, high current implantation and high energy implantation will be investigated.

Paper Details

Date Published: 9 April 1985
PDF: 8 pages
Proc. SPIE 0530, Advanced Applications of Ion Implantation, (9 April 1985); doi: 10.1117/12.946483
Show Author Affiliations
Michael D. Strathman, Charles Evans & Associates (United States)

Published in SPIE Proceedings Vol. 0530:
Advanced Applications of Ion Implantation
Michael I. Current; Devindra K. Sadana, Editor(s)

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