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Proceedings Paper

Improvements In The JBX-6AIII Series Of Shaped Beam Lithography Tools
Author(s): M Hassel Shearer; Y Nakagawa; W Thompson; N Goto; T Yuasa
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Paper Abstract

Electron Beam Lithography has emerged as the predominant tool for high accuracy mask making. Two basic types of systems have been developed over the past twenty years for mask making operations: Raster scan-spot beam systems conceived by Bell Laboratories and commercialized by Perkin-Elmer as the MEBES Series and Vector Scan-Shaped beam systems such as the internally ysed EL Series by IBM or the commercially available JBX-6A Series developed by JEOL. The remainder of this paper will describe the current model of the JEOL Series, the JBX-6AIII that has evolved over the past 10 years to provide a high throughput, high accuracy mask making system. This system has been improved over previous models in the series with the addition of a high speed data transfer unit and real time shot partitioning function in order to match pattern generation to pattern writing speeds. At the same time the writing accuracies and shot placement size and accuracies have been improved to permit VLSI 1X reticles to be fabricated.

Paper Details

Date Published: 14 June 1988
PDF: 6 pages
Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); doi: 10.1117/12.945663
Show Author Affiliations
M Hassel Shearer, JEOL U.S.A., Inc (United States)
Y Nakagawa, JEOL U.S.A., Inc (United States)
W Thompson, JEOL U.S.A., Inc (United States)
N Goto, JEOL Ltd (Japan)
T Yuasa, JEOL Ltd (Japan)


Published in SPIE Proceedings Vol. 0923:
Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII
Arnold W. Yanof, Editor(s)

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