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Proceedings Paper

A Simple Metal Pn Polymer Process Using Pulsed Electron Beams In Soft Vacuum
Author(s): J Krishnaswamy; Mark Eyolfson; L Li; G J Collins; H Hiraoka; Mary Ann Caolo
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Paper Abstract

We describe the proximity patterning using 28 kV, soft vacuum exposing electrons of silver, copper and gold containing metal-polymer composite films. The cross-linking of the metal doped polyamic acid, resulting in reduced solubility of exposed regions, leads to successful patterning following conventional wet development. The patterned films were found to contain the metal content redistributed, preferentially enriching the surface during the imidization cure, as supported by a variety of surface analysis methods.

Paper Details

Date Published: 14 June 1988
PDF: 8 pages
Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); doi: 10.1117/12.945659
Show Author Affiliations
J Krishnaswamy, Colorado State University (United States)
Mark Eyolfson, Colorado State University (United States)
L Li, Colorado State University (United States)
G J Collins, Colorado State University (United States)
H Hiraoka, IBM Almaden Research Laboratories (United States)
Mary Ann Caolo, Hewlett-Packard Inc (United States)

Published in SPIE Proceedings Vol. 0923:
Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII
Arnold W. Yanof, Editor(s)

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