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Proceedings Paper

A New Electron Beam/Deep Ultra Violet (EB/DUV) Cyanoacrylate Resist Technology
Author(s): W M Kelly; A Doyle; E. Noonan; J Woods; J Rooney
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Paper Abstract

This paper describes a vapour coating technique for depositing polycyanoacrylate films up to 8um thick on semiconductor substrates. These films are suitable for use as EB/DUV resists and we present their measured characteristics. Vapour-deposited films have better plasma etching resistance than similar spun-on films.

Paper Details

Date Published: 14 June 1988
PDF: 6 pages
Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); doi: 10.1117/12.945654
Show Author Affiliations
W M Kelly, University College (Ireland)
A Doyle, University College (Ireland)
E. Noonan, University College (Ireland)
J Woods, Loctite Ltd (Ireland)
J Rooney, Loctite Corporation Ltd (United States)


Published in SPIE Proceedings Vol. 0923:
Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII
Arnold W. Yanof, Editor(s)

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