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Proceedings Paper

Transformation Of Pattern Personality In E-Beam Lithography : A Conceptual Approach
Author(s): F Coopmans; E Froyen; R Jonckheere
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Paper Abstract

This paper discusses the concept of pattern personality and its application to the characterization of different software and technological aspects in E-Beam direct write lithography. In this approach the personality of a pattern is related to a spectrum of the characteristic dimensions of a design. We explain simple techniques to obtain these spectra and indicate how they can be implied to predict and decide on the best writing strategy. Pattern personality is intended to be used as a compressed format that still contains enough information to base decisions on and compute the impact of processing steps on the pattern fidelity.

Paper Details

Date Published: 14 June 1988
PDF: 5 pages
Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); doi: 10.1117/12.945652
Show Author Affiliations
F Coopmans, IMEC (Belgium)
E Froyen, IMEC (Belgium)
R Jonckheere, IMEC (Belgium)

Published in SPIE Proceedings Vol. 0923:
Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII
Arnold W. Yanof, Editor(s)

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