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Proceedings Paper

Design Of A New, Two Lens Ion Gun For Micromachining
Author(s): Jon Orloff; John Whitney
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Paper Abstract

A two lens, 25 keV electrostatic ion gun has been constructed which uses a liquid metal ion source and which is capable of high resolution (50 nanometers) and high current density in the focused spot (J > 3 A/cm2) at reasonable working distances (25 mm). Variable current is achieved by using a variable aperture between the lenses. The high performance is a result of optimizing the state of focus for the lenses for each aperture angle. The effect of a beam crossover between the lenses has been calculated and a crossover system performance is compared with collimated and optimized systems. While the best performance can be achieved by optimization, good performance can be achieved with a crossover if the crossover position is properly chosen.

Paper Details

Date Published: 14 June 1988
PDF: 11 pages
Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); doi: 10.1117/12.945641
Show Author Affiliations
Jon Orloff, Oregon Graduate Center (United States)
John Whitney, FEI Company (United States)


Published in SPIE Proceedings Vol. 0923:
Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII
Arnold W. Yanof, Editor(s)

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