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Proceedings Paper

Hybrid Device Process Using A Focused Ion Beam And An Optical Stepper
Author(s): Yukinori Ochiai; Yoshikatsu Kojima; Shinji Matsui; Akira Mochizuki; Masamitsu Yamauchi
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Paper Abstract

The focused ion beam (FIB) process has been examined for device production with an optical stepper. The FIB system developed performs and alignment procedure with a precise controlled stage. The registration accuracy attained by FIB lithography using Be and Si ions with the same or different ion energies showed good values with alignment marks covered with resists. The hybrid process with fine pattern delineation depending on FIB and with high throughput depending on an optical stepper indicated a promising tool for submicron devices.

Paper Details

Date Published: 14 June 1988
PDF: 8 pages
Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); doi: 10.1117/12.945639
Show Author Affiliations
Yukinori Ochiai, NEC Corp (Japan)
Yoshikatsu Kojima, NEC Corp (Japan)
Shinji Matsui, NEC Corp (Japan)
Akira Mochizuki, NEC Corp (Japan)
Masamitsu Yamauchi, NEC Corp (Japan)


Published in SPIE Proceedings Vol. 0923:
Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII
Arnold W. Yanof, Editor(s)

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