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Proceedings Paper

A Focusing Column For A Low Energy Focused Ion Beam Instrument
Author(s): Haruo Kasahara; Hiroshi Sawaragi; Ryuso Aihara; M.Hassel Shearer
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Paper Abstract

Low energy FIB less than 1 keV is useful for shallow doping or gas-assisted etching without damage to the substrate. An optical system with a retarding field has the ability to focuse an ion beam of low energy into a spot less than 0.1 μm in diameter. An improved type of the retarding mode optical system with a retarding electrode was designed, and some optical property calculations were achieved for this system. A retarding electrode above the specimen surface enables SE detection, but it worsens the focusing properties. Better focusing conditions are found by introducing a condenser lens to this system.

Paper Details

Date Published: 14 June 1988
PDF: 5 pages
Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); doi: 10.1117/12.945637
Show Author Affiliations
Haruo Kasahara, JEOL Ltd (Japan)
Hiroshi Sawaragi, JEOL Ltd (Japan)
Ryuso Aihara, JEOL Ltd (Japan)
M.Hassel Shearer, JEOL USA.,Inc (United States)


Published in SPIE Proceedings Vol. 0923:
Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII
Arnold W. Yanof, Editor(s)

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