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Proceedings Paper

Microcircuit Modification Using Focused Ion Beams
Author(s): B W Ward; N. P Economou; D. C Shaver; J E. Ivory; M. L Ward; L. A, Stern
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Paper Abstract

Focused-ion-beam (FIB) microcircuit modification is a maturing technology which provides an accurate method of modifying the metal levels of an in-process or completed integrated circuit. New FIB processes are being developed which facilitate submicrometer conductor disconnects and conductor creation. We present a description of the key elements of an FIB system designed for this application and provide results of the machine's operation.

Paper Details

Date Published: 14 June 1988
PDF: 5 pages
Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); doi: 10.1117/12.945636
Show Author Affiliations
B W Ward, Micrion Corporation (United States)
N. P Economou, Micrion Corporation (United States)
D. C Shaver, Micrion Corporation (United States)
J E. Ivory, Micrion Corporation (United States)
M. L Ward, Micrion Corporation (United States)
L. A, Stern, Micrion Corporation (United States)

Published in SPIE Proceedings Vol. 0923:
Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII
Arnold W. Yanof, Editor(s)

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