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Proceedings Paper

Compact SR Light Source For X-Ray Lithography
Author(s): Noriyuki Takahashi
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Paper Abstract

The compact synchrotron-radiation (SR) source is being developed for industrial use, especially for X-ray lithography. This source named AURORA, consists of a 150-MeV microtron injector, a 650-MeV superconduct-ing electron storage ring, and SR light channels. The injector is a pulsed racetrack microtron, which is 1.1-m width, 3.7-m length, and 1.5-m height. The storage ring is a superconducting weak-focusing single-magnet machine of 1-m orbital diameter, having an outside diameter of 3 m and a height of 2.2 m. The source size is uniform throughout the circumference, ar=1.4 mm in the radial direction, and σz= 0.2 mm in the vertical direc-tion. The critical wavelength is 1.0 nm. The irradiative power is 1.5 W/mrad at a stored electron current of 300 mA. It is anticipated that the lifetime of the beam will exceed 24 hours. Sixteen outlets are available for SR emission from the ring. Prototype machines are presently under construction. The present status and details of the machines will be reported in a later section of this paper.

Paper Details

Date Published: 14 June 1988
PDF: 8 pages
Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); doi: 10.1117/12.945631
Show Author Affiliations
Noriyuki Takahashi, Sumitomo Heavy Industries, Ltd. (Japan)


Published in SPIE Proceedings Vol. 0923:
Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII
Arnold W. Yanof, Editor(s)

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