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Proceedings Paper

Fabrication And Optimization Of X-Ray And VUV-Gratings
Author(s): M. Breidne; L. Mattsson
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Paper Abstract

An ion-etching technique for fabrication of X-ray and VUV gratings will be presented. A photoresist grating, made holographically, is bombarded by Ar-ions and the grating profile is transfered into the substrate. By using a theoretical formalism based on the Rayleigh theory the profile that gives the highest efficiency for a given mounting can be calculated. We will discuss how to design the photoresist grating and the etch process in order to obtain the optimal profile. Measured efficiency curves at λ=44 Å will be presented.

Paper Details

Date Published: 12 December 1984
PDF: 6 pages
Proc. SPIE 0503, Application, Theory, and Fabrication of Periodic Structures, DiffractionGratings, and Moire Phenomena II, (12 December 1984); doi: 10.1117/12.944818
Show Author Affiliations
M. Breidne, The Royal Institute of Technology (Sweden)
L. Mattsson, University of Uppsala (Sweden)


Published in SPIE Proceedings Vol. 0503:
Application, Theory, and Fabrication of Periodic Structures, DiffractionGratings, and Moire Phenomena II
Jeremy M. Lerner, Editor(s)

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