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Proceedings Paper

Fabrication Of Binary Optics Using Electron Beam Lithography
Author(s): James Logue
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Paper Abstract

Electron beam lithography is applicable to the fabrication of binary optics. Practical aspects of generating binary masks for zone plates and diffraction gratings using the Manu-facturing Electron Beam Exposure System (MEBES III) at Perkin-Elmer are discussed.

Paper Details

Date Published: 24 May 1988
PDF: 5 pages
Proc. SPIE 0884, Computer-Generated Holography II, (24 May 1988); doi: 10.1117/12.944165
Show Author Affiliations
James Logue, Perkin-Elmer Corporation (United States)

Published in SPIE Proceedings Vol. 0884:
Computer-Generated Holography II
Sing H. Lee, Editor(s)

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