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Proceedings Paper

Application Of Electron-Beam Lithography At Csem For Fabricating Computer-Generated Holograms
Author(s): H Buczek; J M Teijido
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Paper Abstract
This paper presents the use of a standard electron-beam lithography for the fabrication of computer-generated holograms (CGH).
Paper Details
Date Published: 24 May 1988
PDF: 8 pages
Proc. SPIE 0884, Computer-Generated Holography II, (24 May 1988); doi: 10.1117/12.944159
Show Author Affiliations
H Buczek, CSEM (Switzerland)
J M Teijido, CSEM (Switzerland)

Published in SPIE Proceedings Vol. 0884:
Computer-Generated Holography II
Sing H. Lee, Editor(s)
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