
Proceedings Paper
Application Of Electron-Beam Lithography At Csem For Fabricating Computer-Generated HologramsFormat | Member Price | Non-Member Price |
---|---|---|
$14.40 | $18.00 |
![]() |
GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. | Check Access |
Paper Abstract
This paper presents the use of a standard electron-beam lithography for the fabrication of computer-generated holograms (CGH).
Paper Details
Date Published: 24 May 1988
PDF: 8 pages
Proc. SPIE 0884, Computer-Generated Holography II, (24 May 1988); doi: 10.1117/12.944159
Published in SPIE Proceedings Vol. 0884:
Computer-Generated Holography II
Sing H. Lee, Editor(s)
PDF: 8 pages
Proc. SPIE 0884, Computer-Generated Holography II, (24 May 1988); doi: 10.1117/12.944159
Show Author Affiliations
H Buczek, CSEM (Switzerland)
J M Teijido, CSEM (Switzerland)
Published in SPIE Proceedings Vol. 0884:
Computer-Generated Holography II
Sing H. Lee, Editor(s)
© SPIE. Terms of Use
