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Proceedings Paper

Plasma Sources For Development Of Growth Techniques For Diamond-Like Coatings
Author(s): C C Tsai; F W Baity; W K Dagenhart; W L Gardner; H H Haselton; D E Schechter; W L Stirling
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Paper Abstract

Thin, pure, hard carbon films about 1 pm thick have been deposited on a water-cooled copper plate installed in a continuous-wave (cw) plasma source with graphite walls. The transparent, glassy films were observed after several thousand multisecond pulses of intense hydrogen discharges. The properties of these films and the operating conditions of the plasma, source are described. Many ion beam and rf sources are available in the Fusion Energy Division of the Oak Ridge National Laboratory (ORNL). The potential application of these plasma sources to growing large, thick diamond films is discussed.

Paper Details

Date Published: 18 May 1988
PDF: 4 pages
Proc. SPIE 0877, Micro-Optoelectronic Materials, (18 May 1988); doi: 10.1117/12.943939
Show Author Affiliations
C C Tsai, Oak Ridge National Laboratory (United States)
F W Baity, Oak Ridge National Laboratory (United States)
W K Dagenhart, Oak Ridge National Laboratory (United States)
W L Gardner, Oak Ridge National Laboratory (United States)
H H Haselton, Oak Ridge National Laboratory (United States)
D E Schechter, Oak Ridge National Laboratory (United States)
W L Stirling, Oak Ridge National Laboratory (United States)


Published in SPIE Proceedings Vol. 0877:
Micro-Optoelectronic Materials
Carl A. Kukkonen, Editor(s)

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