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Proceedings Paper

Plasma Focus Device As An Unconventional Source Of High-Energy Electrons And Ions For Pumping Of Lasers
Author(s): Ludwik Pokora; Janusz Wawer
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Paper Abstract

The paper presents a characteristic of plasma focus (PF) devices as new nonclassic sources of charged particles for pumping of gas lasers. The principle of operation of such a source is given and characteristics of generated charged particles are shown. Energy of particles reaches the value of SMeV at supply voltage of 20-40kV. Measure methods of the beam parameters are described and the scheme of the experimental arrangement used to determine the conditions of Ar-N2 laser pumping by ions emitted from a lkJ-PF device is presented.

Paper Details

Date Published: 19 October 1987
PDF: 9 pages
Proc. SPIE 0859, Laser Technology II, (19 October 1987); doi: 10.1117/12.943351
Show Author Affiliations
Ludwik Pokora, Institute of Plasma Physics and Laser Microfusion (Poland)
Janusz Wawer, Institute of Plasma Physics and Laser Microfusion (Poland)


Published in SPIE Proceedings Vol. 0859:
Laser Technology II

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